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SUPPRESSION OF NON-RADIATIVE RECOMBINATION IN MATERIALS WITH DEEP CENTRESCM Patents

Índice de la ficha

Updated at
24/07/2026
Numero publicacion
EP.1978565.A1
Fecha publicacion
08/10/2008
Numero solicitud
EP20060841735

En detalle

Resumen

Procedure to obtain semiconductor materials with electronic levels close to the mid-bandgap ( deep levels ) which do not suffer from the non-radiative recombination by multiple phonon emission (MPE) associated to the existence of that kind of levels. The procedure consist in doping by any means the semiconductor with a density sufficiently high of the impurities producing the deep level, so that a Mott transition of the electron wavefunctions representing the localized states in the impurities is induced, in such a way that these wavefunctions become distributed across the whole semiconductor and are shared by all the impurities. When this happens, local charge density variations, and thus non-radiative recombination by MPE, disappear. Based on the resulting materials (semiconductors with three separate energy bands and radiative behavior (1), (2) and (3)) different optoelectronic devices can be fabricated (solar cells, photodetectors, lasers, etc.) capable of using electronic radiative transitions more efficiently.

Reivindicaciones

1. A method for suppressing non-radiative recombination in semiconductors with intermediate levels due to impurities consisting of increasing the concentration of such impurities to a point at which the wavefunctions representing the trapped states become delocalized and they are shared among many impurities in the semiconductor. 2. A method according to claim 1, characterized in that the concentration of impurities is achieved by ionic implantation, by diffusion of the impurities into the semiconductor material or by chemical or physical deposition of an epitaxial crystal of a suitable composition containing the impurities. 3. A method according to claims 1 or 2, characterized in that the redistribution of the impurities is assisted by thermal annealing. 4. A method according to claims 1 to 3, characterized in that the semiconductor belongs to group III-V or II-VI and the impurities are any chalcogenide or any transition element. 5. A method according to claims 1 to 4, characterized in that the density of impurities is increased to over 5.9x10<19> cm<-3> . 6. A material (intermediate band material) manufactured according to the method described in claims 1 to 5, characterized by the existence of an electronic band (intermediate band) isolated from the conduction and valence bands through a null density of states. 7. A material manufactured according to the method described in claims 1 to 5, characterized by having intermediate levels. 8. A material according to claims 6 or 7, characterized in that the intermediate band or the intermediate levels originate from a chemical compound or an alloy where the species of lower concentration have a density above the density deduced from claim 1 or indicated in claim 5. 9. Use of the method according to claims 1 to 5 and of one or more of the intermediate band materials or materials with intermediate levels according to claims 6 to 8 for the manufacture of solar cells, photodetectors, LEDs, lasers and any other electrical or optoelectronic device.

Etiquetas

Inventores
Luque Lopez AntonioMarti Vega AntonioTablero Crespo CesarAntolin Fernandez Elisa
Solicitantes
Universidad Politécnica de Madrid
Clasificacion ipc
H01L 31/ 0296 A IH01L 31/ 0304 A IH01L 31/ 0352 A IH01L 31/ 06 A IH01L 31/ 08 A IH01B 1/ 00 A IH01L 21/ 265 A I
Clasificacion cpc
252/500257/E21.334438/530
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