Resumen
The invention relates to a novel implant based on titanium, consisting of a titanium coating formed over biomaterials, applicable in bone implantology. The nanotopographical characteristics of said implants inhibit bacterial adhesion and formation of bacterial biofilm on the surface, the implants simultaneously exhibiting suitable properties for the adhesion, extension, and proliferation of the bone-forming cells. The invention also relates to a method for producing the implant by means of oblique incidence techniques and to the use thereof in bone implantology..
Reivindicaciones
1. Implant that comprises a titanium coating deposited on a substrate, characterised in that : - the substrate comprises a biomaterial with a root mean square roughness lower than 5 nm on a surface area of 4 µm<2> , - the coating has a purity greater than 95% and comprises nanostructured titanium formed by metallic titanium and a titanium oxide layer, - the nanostructured titanium has a nanocolumnar form, wherein the diameter of the nanocolumns ranges between 30 and 100 nm, the height ranges between 100 and 300 nanometres, and the space between the nanocolumns ranges between 50 and 150 nanometres, with a nanocolumn tilt angle with respect to the vertical of the substrate ranging between 0° and 30°. 2. Implant according to claim 1, wherein the substrate biomaterial comprises at least one of the following materials: - commercially-pure medical-grade titanium with a purity greater than 99%, for periodontal implants, - medical-grade metallic alloys, such as CrCo, stainless steel and Ti6Al4V, for orthopaedic, cranial and maxillofacial applications. 3. Implant according to claim 2, wherein the substrate biomaterial comprises Ti6Al4V. 4. Implant according to any of claims 2 to 3, wherein the substrate biomaterial is shaped into structures that comprise discs, bolts, nails, rods, osteosynthesis plates and other fracture fixation devices, generally manufactured with stainless steel. 5. Process for obtaining the implant of claims 1 to 4, which comprises depositing the coating on the substrate using glancing-angle (GLAD) techniques. 6. Process according to claim 5, wherein the deposition is performed in a cathode sputtering system. 7. Process according to claim 6, wherein the cathode sputtering system comprises a magnetron. 8. Process according to claim 7, wherein the deposition comprises the following steps: a) introduction of the substrate into the cathode sputtering system chamber, b) closing of the chamber and creation of a vacuum, c) introduction of gas into the chamber, d) electromagnetic excitation of the gas particles present in the chamber by means of a source, e) collision of the particles present in the chamber against a titanium target, f) deposition of the material detached from the target on the substrate, wherein the product of multiplying the operating pressure (P<g> ) by the target-substrate distance (L) fulfils the ballistic regime condition for the sputtering of Ti, given by p<g> L < 12 Pa cm, and the substrate forms a tilt angle greater than 60° with respect to the target. 9. Process according to claim 8, wherein the vacuum reached is lower than 10<-4> Pa, and the chamber fulfils the condition that the L/d quotient is greater than 3.5, where d is the diameter of the target and L is the target-substrate distance. 10. Use of the implant defined in claims 1 to 4 in osseous implantology. 11. Use according to claim 10, in implants for temporary use or for permanent use.
